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Institution:信息科学与工程学院
Title of Paper:Comprehensive Analysis of Oxidant Effects During ALD Process of Hf0.5Zr0.5O2 Ferroelectric Thin Films
Journal:IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
First Author:李晓鹏
Document Code:1934548234689994754
Number of Words:3
Translation or Not:No
Date of Publication:2025-01
Release Time:2025-10-02