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一种基于动态参数刻蚀与后处理的碳化硅刻蚀方法
Release Time:2025-09-16| Hits:

Title:一种基于动态参数刻蚀与后处理的碳化硅刻蚀方法
Institution:新一代半导体材料研究院
Type of Patent:Invent
Application Number:202510857652.5
Number of Inventors:3
Service Invention or Not:No
Application Date:2025-06-25
Publication Date:2025-08-26
Authorization Date:2025-08-26
Release Time:2025-09-16