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Prediction of the TiS2 Bilayer with Self-Intercalation: Robust Ferromagnetic Semiconductor with a High Curie Temperature
Affiliation of Author(s):化学与化工学院
Journal:The Journal of Physical Chemestry C
First Author:张方宇
Document Code:1889208965549924354
Number of Words:7
Translation or Not:no
Date of Publication:2025-03-20