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个人信息Personal Information
博士生导师 硕士生导师
毕业院校：Nagoya Institute of Technology, Japan
学历：博士研究生毕业
学位：博士生
在职信息：在职
所在单位：国家胶体材料工程技术研究中心
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- [1] 李申申. Oxygen Inhibition Suppression by Photoinduced Electron Transfer in Oxime Ester/Triarylalkylborate Photoinitiators. Macromolecules , 58, 2053, 2025.
- [2] 刘越. Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists. small, 2025.
- [3] 陈钰. Fluorescent fluorinated amphiphilic copolymer for antimicrobial fluorescence imaging. Journal of Molecular Liquids, 414, 2024.
- [4] 郭雅娜. High patterning photosensitivity by a novel fluorinated copolymer formulated resist. European Polymer Journal, 211, 2024.
- [5] 刘越. Polymerizable Nonionic Perfluorinated Photoacid Generators for High-Resolution Lithography. Small Methods, 2024.
- [6] . Graphite Nitride Carbon (g-C3N4) and Borates as Near-UV Heterogeneous Photoinitiators for Acrylate Photopolymerization. ACS Applied Polymer Materials, 6, 8721, 2024.
- [7] 郭旭彬. Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists. MICROELECTRONIC ENGINEERING, 290, 2024.
- [8] 刘俊俊. Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists. Polymers, 16, 2024.
- [9] 张俊英. Tetraphenylethene-based macrocycles with dual-ring topology: synthesis, structures, and applications. Organic Chemistry Frontiers, 10, 6225-6239, 2023.
- [10] 张俊英. Photo-induced tunable luminescence from an aggregated amphiphilic ethylene-pyrene derivative in aqueous media. CHINESE CHEMICAL LETTERS Journal, 35, 2023.
- [11] 刘俊俊. Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists. polymers, 16, 2024.
- [12] 张俊英. Highly selective and sensitive detection of hyaluronic acid based on a pyrene-cored cationic aggregation-induced emission luminogen. Microchemical Journal, 200, 110395, 2024.
- [13] 郭雅娜. High patterning photosensitivity by a novel fluorinated copolymer formulated resist. European Polymer Journal, 211, 113009, 2024.
- [14] 刘俊俊. New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection. polymers, 2023.
- [15] 刘俊俊. New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection. POLYMERS, 15, 2023.
- [16] 陈钰. Self-assembly behavior of fluorinated amphiphilic copolymer in aqueous solution and its properties in the solid film state. Journal of Molecular Liquids , 2023.
- [17] 谭禹. Versatile Light-Mediated Synthesis of Dry Ion-Conducting Dynamic Bottlebrush Networks with High Elasticity, Interfacial Adhesiveness, and Flame Retardancy. Macromolecules , 55, 9715, 2022.
- [18] 刘俊俊. New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection. polymers, 15, 2023.
- [19] 康文兵. Design of a large Stokes shift ratiometric fluorescent sensor with hypochlorite detection towards the potential application as invisible security ink. Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy , 285, 2023.
- [20] 梁之威. High-crystalline polymeric carbon nitride flake composed porous nanotubes with significantly improved photocatalytic water splitting activity: The optimal balance between crystallinity and surface .... Chemical Engineering Journal , 432, 134388, 2022.