Wenxiang Mu
Associate Professor
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Rapid epitaxy of 2-inch and high-quality α-Ga2O3 films by Mist-CVD method
  • Institution:
    新一代半导体材料研究院
  • Title of Paper:
    Rapid epitaxy of 2-inch and high-quality α-Ga2O3 films by Mist-CVD method
  • Journal:
    Journal of Semiconductors
  • First Author:
    王晓杰
  • Document Code:
    131FF0B9E69B46ADB8D020C55131783B
  • Issue:
    44
  • Number of Words:
    7
  • Translation or Not:
    No
  • Date of Publication:
    2023-04
  • Release Time:
    2023-05-18
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