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LI Yuan

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Postgraduate (Doctoral)

Shandong University

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Date of Employment:2017-12-26

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Yuan Li > Scientific Research > Paper Publications

Extending the Scaling Limit of Silicon Channel Transistors Through hhk-Silicene Monolayer: A Computational Study

Release Time:2023-05-17 Hits:

Institution:信息科学与工程学院
Journal:IEEE Transactions on Electron Devices
Key Words:Field-effect transistors (FETs);hybrid honeycomb-kagome (hhk)-silicene;scaling limit;steep-slope;sub-5 nm
First Author:桑鹏鹏
Document Code:1539149533830766593
Volume:69
Issue:6
Page Number:3494-3498
Number of Words:3
Translation or Not:No
Date of Publication:2022-06

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