• 2009-09 — 2013-06
  山东师范大学
  化学
  理学学士学位
• 2013-09 — 2019-06
  北京师范大学
  高分子化学与物理
  理学博士学位

• 2023-08 — 至今
   国家胶体材料工程技术研究中心  山东大学 
• 2019-07 — 2023-07
   核能与新能源技术研究院  清华大学 

1.集成电路芯片制造关键材料—光刻胶

(1) 王倩倩.Exceptional light sensitivity by thiol−ene click lithography.J. Am. Chem. Soc..2023,145 (5):3064-3074

(2) 王倩倩.Suppressing of secondary electron diffusion for high-precision nanofabrication.Materials Today.2023,67 :95-105

(3) 邢士翠.Regulation and synthesis of mixed-ligand titanium-oxide nanoparticles for 12 nm nanolithography.Small.2025,22 (7):e10779

(4) 刘越.Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists.Small.2025,21 (15):2412297

(5) 李申申.Oxygen Inhibition Suppression by Photoinduced Electron Transfer in Oxime Ester/Triarylalkylborate Photoinitiators.Macromolecules.2025,58 (4):2053

(6) 王倩倩.Theoretical insights into the solubility polarity switch of metal-organic nanoclusters for nanoscale patterning.Small Methods.2023,7 (10):2300309

(7) 邢士翠.Electron beam lithography with carboxylate-modified TiO2 nanoparticles for sub-20 nm features.Small Methods.2026,10 (4):1332

(8) 郭雅娜.High patterning photosensitivity by a novel fluorinated copolymer formulated resist.European Polymer Journal.2024,211 :113009

(9) 李申申.Ambient condition and oxygen-tolerant photopolymerization from near-UV to blue light via naphthimide–borate synergy.POLYMER CHEMISTRY.2025,16 (42):4637

(10) 刘越.Polymerizable Nonionic Perfluorinated Photoacid Generators for High-Resolution Lithography.Small Methods.2024,8 :2400112

(11) 李申申.Graphite Nitride Carbon (g-C3N4) and Borates as Near-UV Heterogeneous Photoinitiators for Acrylate Photopolymerization.ACS Applied Polymer Materials.2024,6 (15):8721

(12) 郭旭彬.Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists.MICROELECTRONIC ENGINEERING.2024,290 :112196

(13) 刘俊俊.Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists.polymers.2024,16 (6)

(14) 王倩倩.One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning.European Ploymer Journal.2019,114 :11-18

(15) 王倩倩.A new type of sulfonium salt copolymers generating polymeric photoacid: Preparation, properties and application.Reactive&Functional Plymers.2018,130 :118-125

1. 光刻胶及亚胺类材料的图案化方法

2. 光刻胶组合物、用它形成光刻图案的方法及其用途

3. 光刻胶、光刻胶的图案化方法及集成电路板的刻蚀方法

4. 一种光产酸催化的聚亚胺微球及其制备方法

1. （包干项目）含氟金属氧化锆光刻胶的控制合成与光刻性能研究, 2025-01-01-2027-12-31

2. （包干项目）含卤素金属氧化物纳米颗粒光刻胶的控制合成与感光成像机理研究, 2024-08-23-2027-12-31

3. 应用于EUV光刻领域的光刻胶原材料开发, 2024-01-11-2026-12-31