Paper Publications
Hydrogen Silsesquioxane (HSQ) Etching Resistance Dependence on Substrate During Dry Etching
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Journal:
physica status solidi (a)
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All the Authors:
Kazy Shariar,Guangyang Lin,Peng Cui
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First Author:
Jie Zhang
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Correspondence Author:
Yuping Zeng
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Volume:
216
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Issue:
1
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Page Number:
1800530
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Translation or Not:
no
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Included Journals:
SCI