Title of Paper:Hydrogen Silsesquioxane (HSQ) Etching Resistance Dependence on Substrate During Dry Etching

Journal:physica status solidi (a)

First Author:Jie Zhang

Correspondence Author:Yuping Zeng

All the Authors:Kazy Shariar,Guangyang Lin,Peng Cui

Volume:216

Issue:1

Page Number:1800530

DOI Number:10.1002/pssa.201800530

Translation or Not:No

Date of Publication:2018-10

Included Journals:SCI

Release Time:2021-11-29