Paper Publications
Hydrogen Silsesquioxane (HSQ) Etching Resistance Dependence on Substrate During Dry Etching
  • Journal:
    physica status solidi (a)
  • All the Authors:
    Kazy Shariar,Guangyang Lin,Peng Cui
  • First Author:
    Jie Zhang
  • Correspondence Author:
    Yuping Zeng
  • Volume:
    216
  • Issue:
    1
  • Page Number:
    1800530
  • Translation or Not:
    no
  • Included Journals:
    SCI
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