具有氟基气体处理AlN帽层的氮化镓HEMT器件及其制备方法

Release Time:2024-09-05| Hits:

Title:具有氟基气体处理AlN帽层的氮化镓HEMT器件及其制备方法

Institution:新一代半导体材料研究院

Type of Patent:Invent

Application Number:202410612021.2

Number of Inventors:4

Service Invention or Not:No

Application Date:2024-05-17

Publication Date:2024-09-03

Authorization Date:2024-09-03

Release Time:2024-09-05