提高InAlN/GaN高电子迁移率晶体管电学性能的方法

Release Time:2024-05-18| Hits:

Title:提高InAlN/GaN高电子迁移率晶体管电学性能的方法

Institution:新一代半导体材料研究院

Type of Patent:Invent

Application Number:202111558290.8

Number of Inventors:4

Service Invention or Not:No

Application Date:2021-12-20

Publication Date:2024-02-02

Authorization Date:2024-02-02

Release Time:2024-05-18