Impacts of Operation Intervals on Program Disturb in 3D Charge-trapping Triple-level-cell (TLC) NAND Flash Memory
所属单位:信息科学与工程学院
论文名称:Impacts of Operation Intervals on Program Disturb in 3D Charge-trapping Triple-level-cell (TLC) NAND Flash Memory
发表刊物:5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
关键字:3D NAND flash;operation intervals;program disturb;lateral charge migration
第一作者:方晓彤
论文编号:1478212210961420289
字数:3
是否译文:否
发表时间:2021-04