Positive Bias Temperature Instabilities in Vertical Gate-all-around poly-Si Nanowire Field-effect Transistors
所属单位:信息科学与工程学院
论文名称:Positive Bias Temperature Instabilities in Vertical Gate-all-around poly-Si Nanowire Field-effect Transistors
发表刊物:IEEE International Conference on Integrated Circuits, Technologies and Applications (IEEE ICTA)
关键字:GAA poly-Si Nanowire FETs;PBTI;trap charging
第一作者:杨文静
论文编号:1395264523660693505
页面范围:175-176
字数:3
是否译文:否
发表时间:2018-11